Original document(20 pages)  中文版
    The present invention relates to an apparatus and method for cleaning post-etch semiconductor wafers (230) using ultra-pure dry steam.
Application Number
申请号		 99804744 Application Date
申请日		 1999.02.23
Title 名称 Apparatus and method for cleaning semiconductor wafers
Publication Number
公开号		 1295504 Publication Date
公开日		 2001.05.16
Approval Pub. Date Granted Pub. Date
International Classification 分类号 B08B3/00;F26B21/00;F26B21/06
Applicant(s) Name
申请人		 Gamma Precision Technology, Inc.
Address 地址
Inventor(s) Name 发明人 Masato Toshima
Attorney & Agent 代理人 liu xiaofeng

  
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