Original document(8 pages)  中文版
    The invention is a kind of light mantle for contact window process, the mantle has a contact window pattern, and there has a border pattern on edge of the contact window pattern, the border pattern is a semi-exposure area. Because that the border of contact window pattern is semi-exposure pattern, the contact angle between the side wall of aperture of contact window which is patterned and the conducting layer under it can be reduced.
Application Number
申请号		 03104493 Application Date
申请日		 2003.02.18
Title 名称 An etching process
Publication Number
公开号		 1523451 Publication Date
公开日		 2004.08.25
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G03F7/42,G03F7/26,H01L21/3205
Applicant(s) Name
申请人		 AU Optronics Corp.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 zhang bengyuan wu xiaonan

  
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